Influence of sputtering parameters on structures and residual stress of AlN films deposited by DC reactive magnetron sputtering at room temperature

Published 2012 View Full Article

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Title
Influence of sputtering parameters on structures and residual stress of AlN films deposited by DC reactive magnetron sputtering at room temperature
Authors
Keywords
-
Journal
JOURNAL OF CRYSTAL GROWTH
Volume 363, Issue -, Pages 80-85
Publisher
Elsevier BV
Online
2012-10-17
DOI
10.1016/j.jcrysgro.2012.10.008

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