4.4 Article Proceedings Paper

Epitaxial InP nanowire growth from Cu seed particles

Journal

JOURNAL OF CRYSTAL GROWTH
Volume 315, Issue 1, Pages 134-137

Publisher

ELSEVIER
DOI: 10.1016/j.jcrysgro.2010.08.016

Keywords

Nanostructures; Nanowires; Low-pressure metal-organic vapor phase epitaxy; Semiconducting III-V materials; Semiconducting indium phosphide

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Cu-seeded epitaxial growth of vertically aligned InP nanowires is reported for the first time. The nanowires were grown at temperatures between 290 and 420 degrees C by metal-organic vapor phase epitaxy (MOVPE) from particles formed from Cu thin films. In the temperature range of 340-370 degrees C high yields of vertically aligned nanowires could be achieved. The nanowire crystal structure and the particle composition were investigated by TEM and XEDS. The nanowires showed a zinc blende structure and a post-growth particle composition of 64 at% Cu and 36 at% In. (C) 2010 Elsevier B.V. All rights reserved.

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