Investigation of character and spatial distribution of threading edge dislocations in 4H-SiC epilayers by high-resolution topography

Title
Investigation of character and spatial distribution of threading edge dislocations in 4H-SiC epilayers by high-resolution topography
Authors
Keywords
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Journal
JOURNAL OF CRYSTAL GROWTH
Volume 311, Issue 5, Pages 1416-1422
Publisher
Elsevier BV
Online
2008-11-14
DOI
10.1016/j.jcrysgro.2008.11.017

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