4.4 Article

Growth mechanism and optical properties of In2O3 nanorods synthesized on ZnO/GaAs (111) substrate

Journal

JOURNAL OF CRYSTAL GROWTH
Volume 311, Issue 2, Pages 268-271

Publisher

ELSEVIER
DOI: 10.1016/j.jcrysgro.2008.10.062

Keywords

Physical vapor deposition processes; Nanomaterials; Oxides; Semiconductor indium compounds

Ask authors/readers for more resources

Indium oxide (In2O3) nanorods have been grown on a ZnO-buffered GaAs (1 1 1) substrate by radio-frequency magnetron sputtering at a substrate temperature of 350 degrees C. The growth directly on a GaAs (1 1 1) substrate under the same conditions results in In2O3:In nanoclusters rather than in In2O3 nanorods, and an increase in the oxygen pressure leads to a dense In2O3 thin film with grain sizes smaller than 50 nm. The influence of the ZnO buffer layer on the synthesis of the In2O3 nanorods is associated with the presence of three-dimensional defects on the surface via the formation of Zn(/In) eutectics. Photoluminescence emissions are observed from the grown In2O3 nanorods and thin films at room temperature, and the optical bandgap of In2O3 is determined to be similar to 3.66 eV. (C) 2008 Elsevier B.V. All rights reserved.

Authors

I am an author on this paper
Click your name to claim this paper and add it to your profile.

Reviews

Primary Rating

4.4
Not enough ratings

Secondary Ratings

Novelty
-
Significance
-
Scientific rigor
-
Rate this paper

Recommended

No Data Available
No Data Available