4.4 Article

Au-assisted growth of GaAs nanowires by gas source molecular beam epitaxy: Tapering, sidewall faceting and crystal structure

Journal

JOURNAL OF CRYSTAL GROWTH
Volume 310, Issue 2, Pages 356-363

Publisher

ELSEVIER SCIENCE BV
DOI: 10.1016/j.jcrysgro.2007.10.050

Keywords

nanostructures; molecular beam epitaxy; nanowires; semiconducting gallium arsenide; semiconducting III-V materials

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GaAs nanowires grown by gas source molecular beam epitaxy for 3, 10, 30, and 40 min durations were studied by both scanning and transmission electron microscopy, providing a description of the time evolution of the nanowire morphology and structure. Tapered, pencil-shaped wires were observed in which a transformation of the sidewall orientation occurs from {(1) over bar 1 0 1} facets at the tip to {(2) over bar 1 1 0} facets at the base, providing evidence for a layer-by-layer radial growth model. The crystal structure of the nanowires, as well as the nature and frequency of stacking faults, was investigated. Local pseudo-periodicity of defects was observed in the vicinity of the wire base, while defect density decreased as the growth progressed. (C) 2007 Elsevier B.V. All rights reserved.

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