Journal
JOURNAL OF CRYSTAL GROWTH
Volume 310, Issue 4, Pages 777-782Publisher
ELSEVIER
DOI: 10.1016/j.jcrysgro.2007.11.073
Keywords
high resolution x-ray diffraction; metalorganic chemical vapor deposition; oxides; semiconducting II-VI materials
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ZnO(1 1 (2) over bar 0) thin films were successfully grown on LaAlO3 (lanthanum aluminate) (10 0) substrate by atmospheric pressure metalorganic chemical vapor deposition. X-ray diffraction, atomic force microscopy, and scanning electron microscopy showed that ZnO films formed at 450 degrees C were composed of almost all (1 1 (2) over bar 0) oriented grains while (0 0 0 2) oriented ZnO grains started to appear at temperature above 550 degrees C. The a-plane ZnO films consisted of two types of domains with their c-axis perpendicular to each other due to LaAlO3(1 0 0) symmetry with low lattice mismatch along < 1 1 0 >. (C) 2007 Elsevier B.V. All rights reserved.
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