4.7 Article

High density silver nanoparticle monolayers produced by colloid self-assembly on polyelectrolyte supporting layers

Journal

JOURNAL OF COLLOID AND INTERFACE SCIENCE
Volume 364, Issue 1, Pages 39-48

Publisher

ACADEMIC PRESS INC ELSEVIER SCIENCE
DOI: 10.1016/j.jcis.2011.07.059

Keywords

Deposition of silver particles; Kinetics of silver particle deposition; Monolayers of silver particles; Silver nanoparticles; Synthesis of silver sol

Funding

  1. [POIG 01.01.02-12-028/09-00]

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A stable silver nanoparticle suspension was synthesized via the reduction of silver nitrate using sodium borohydride and sodium citrate. The particle's shape and size distribution were measured by various methods. The electrophoretic mobility measurements revealed that the zeta potential of particles was highly negative, increasing slightly with the ionic strength, from -52 mV for I = 10(-5) M to -35 mV for I = 3 x 10(-2) M (for pH = 5.5). The zeta potential of mica modified by the adsorption of cationic polyelectrolytes: PEI and PAH was also determined using the streaming potential measurements. The modified mica sheets were used as substrates for particle monolayers formed via colloid self assembly. The kinetics of this process, proceeding under diffusion-controlled transport conditions, was quantitatively evaluated by a direct enumeration of particles using the AFM and SEM techniques. Both the kinetics of particle deposition and the maximum surface concentration were determined. From the slope of the initial deposition rates, the equivalent diameter of particles was determined to be 16 nm, in agreement with previous measurements. Based on this finding, an efficient method of determining particle size in suspension was proposed. It was also demonstrated that for higher ionic strengths, the maximum coverage of particle monolayers on PAH modified mica exceeded 0.39. The kinetic data were quantitatively interpreted in terms of the random sequential adsorption (RSA) model using the effective hard particle concept. (C) 2011 Elsevier Inc. All rights reserved.

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