4.6 Article

Precise control of interface anisotropy during deposition of Co/Pd multilayers

Journal

JOURNAL OF APPLIED PHYSICS
Volume 116, Issue 20, Pages -

Publisher

AMER INST PHYSICS
DOI: 10.1063/1.4902826

Keywords

-

Funding

  1. UK EPSRC [EP/G032440/1]
  2. EPSRC [EP/G032440/1] Funding Source: UKRI
  3. Engineering and Physical Sciences Research Council [1085135, EP/G032440/1, 1212684] Funding Source: researchfish

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We demonstrate the control of perpendicular magnetic anisotropy (PMA) in multilayer films without modification of either the microstructure or saturation magnetization by tuning the Ar+ ion energy using remote plasma sputtering. We show that for [Co/Pd](8) multilayer films, increasing the Ar+ ion energy results in a strong decrease in PMA through an increase in interfacial roughness determined by X-ray reflectivity measurements. X-ray diffraction and transmission electron microscope image data show that the microstructure is independent of Ar+ energy. This opens a different approach to the in-situ deposition of graded exchange springs and for control of the polarizing layer in hybrid spin transfer torque devices. (C) 2014 AIP Publishing LLC.

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