4.6 Article

The effect of titanium doping on the structure and phase change characteristics of Sb4Te

Journal

JOURNAL OF APPLIED PHYSICS
Volume 114, Issue 12, Pages -

Publisher

AMER INST PHYSICS
DOI: 10.1063/1.4821769

Keywords

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Funding

  1. National Key Basic Research Program of China [2011CBA00607, 2010CB934300]
  2. National Integrate Circuit Research Program of China [2009ZX02023-003]
  3. National Natural Science Foundation of China [61076121]
  4. Science and Technology Council of Shanghai [11DZ22610000]

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As a growth-dominated phase change material, Sb4Te (ST) has fast crystallization speed while thermal stability is very poor, which makes it unsuitable for application in phase change random access memory (PCRAM). After doping Ti, the crystallization temperature is greatly improved to 210.33 degrees C, which is much higher than that of conventional Ge2Sb2Te5 (similar to 150 degrees C), and the melting point is reduced to 540.27 degrees C. In addition, grain size of crystalline Ti-doped Sb4Te (TST) film is significantly decreased to nanoscale. Ti atom is believed to occupy the lattice site of Sb atom in TST. With good thermal stability, TST-based PCRAM cell also has fast crystallization rate of 6 ns. Furthermore, the energy consumption is also lower than that of Ge2Sb2Te5-based one. Endurance of exceeding 2E5 cycles is obtained with a resistance ratio of one order of magnitude. Therefore, Ti doping seems to be a good way to solve the contradiction between thermal stability and fast crystallization speed of Sb-Te alloys. (C) 2013 AIP Publishing LLC.

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