4.6 Article

Strain controlled metal-insulator transition in epitaxial NdNiO3 thin films

Journal

JOURNAL OF APPLIED PHYSICS
Volume 114, Issue 24, Pages -

Publisher

AMER INST PHYSICS
DOI: 10.1063/1.4858455

Keywords

-

Funding

  1. National Key Project for Basic Research of China [2013CB922301]
  2. National Science Foundation of China [11374098, 11304097]
  3. Science and Technology Commission of Shanghai Municipality [12PJ1402900, 13PJ1402700]
  4. Scientific Research Foundation of East China Normal University

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We have fabricated epitaxial thin films of NdNiO3 (NNO) on various single crystal substrates. The transport properties of NNO films are very sensitive to substrate-controlled epitaxial strain. As the strain varies from tensile to compressive, the Mott metal-insulator transition of NNO films shifts to low temperatures. Under a larger compressive strain, the film on LaSrAlO4 substrate exhibits a practically metallic transport characteristic. We have found that the conductivities of NNO films at low temperatures follow Mott's variable range hopping mechanism rather than thermal activation model and the epitaxial strain has a strong effect on Mott's parameters of NNO films. These findings demonstrate that the electronic transport of NNO thin films can be tuned by the epitaxial strain for next-generation perovskite-based microelectronic devices. (C) 2013 AIP Publishing LLC.

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