Ultrahigh throughput plasma processing of free standing silicon nanocrystals with lognormal size distribution

Title
Ultrahigh throughput plasma processing of free standing silicon nanocrystals with lognormal size distribution
Authors
Keywords
-
Journal
JOURNAL OF APPLIED PHYSICS
Volume 113, Issue 13, Pages 134306
Publisher
AIP Publishing
Online
2013-04-04
DOI
10.1063/1.4799402

Ask authors/readers for more resources

Discover Peeref hubs

Discuss science. Find collaborators. Network.

Join a conversation

Ask a Question. Answer a Question.

Quickly pose questions to the entire community. Debate answers and get clarity on the most important issues facing researchers.

Get Started