Nondestructive characterization of a TiN metal gate: Chemical and structural properties by means of standing-wave hard x-ray photoemission spectroscopy

Title
Nondestructive characterization of a TiN metal gate: Chemical and structural properties by means of standing-wave hard x-ray photoemission spectroscopy
Authors
Keywords
-
Journal
JOURNAL OF APPLIED PHYSICS
Volume 112, Issue 11, Pages 114501
Publisher
AIP Publishing
Online
2012-12-04
DOI
10.1063/1.4765720

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