Optimization of extreme ultraviolet photons emission and collection in mass-limited laser produced plasmas for lithography application

Laser-produced plasma versus laser-assisted discharge plasma: physics and technology of extreme ultraviolet lithography light sources

(2012) Guido Schriever et al.   Journal of Micro-Nanolithography MEMS and MOEMS

Combined effects of prepulsing and target geometry on efficient extreme ultraviolet production from laser produced plasma experiments and modeling

(2011) Ahmed Hassanein   Journal of Micro-Nanolithography MEMS and MOEMS

Damage to nearby divertor components of ITER-like devices during giant ELMs and disruptions

(2010) V. Sizyuk et al.   NUCLEAR FUSION

Effects of plasma spatial profile on conversion efficiency of laser-produced plasma sources for EUV lithography

(2009) Ahmed Hassanein   Journal of Micro-Nanolithography MEMS and MOEMS

Efficient 13.5nm extreme ultraviolet emission from Sn plasma irradiated by a long CO2 laser pulse

(2008) Y. Tao et al.   APPLIED PHYSICS LETTERS

Pure-tin microdroplets irradiated with double laser pulses for efficient and minimum-mass extreme-ultraviolet light source production

(2008) Shinsuke Fujioka et al.   APPLIED PHYSICS LETTERS

Plasma physics and radiation hydrodynamics in developing an extreme ultraviolet light source for lithography

(2008) Katsunobu Nishihara et al.   PHYSICS OF PLASMAS