Comparative time-resolved study of the XeF2 etching of Mo and Si

Heat treatment of molybdenum under vacuum conditions

(2009) Gábor Dobos et al.   INTERNATIONAL JOURNAL OF REFRACTORY METALS & HARD MATERIALS

Mechanism and dynamics of the reaction of XeF2 with fluorinated Si(100): Possible role of gas phase dissociation of a surface reaction product in plasmaless etching

(2009) R. C. Hefty et al.   JOURNAL OF CHEMICAL PHYSICS

Characterization of High-Pressure $\hbox{XeF}_{2}$ Vapor-Phase Silicon Etching for MEMS Processing

(2009) C. Easter et al.   JOURNAL OF MICROELECTROMECHANICAL SYSTEMS

Post-annealing effect upon optical properties of electron beam evaporated molybdenum oxide thin films

(2008) Shih-Yuan Lin et al.   APPLIED SURFACE SCIENCE

Preparation and characterization of well-ordered MoOx films on Cu3Au(100)–oxygen substrate (CAOS)

(2008) Fabiana M.T. Mendes et al.   CATALYSIS TODAY

Atom abstraction and gas phase dissociation in the interaction of XeF2 with Si(100)

(2008) R. C. Hefty et al.   JOURNAL OF CHEMICAL PHYSICS