Si+ ion implantation for strain relaxation of pseudomorphic Si1−xGex/Si(100) heterostructures

Published 2009 View Full Article

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Title
Si+ ion implantation for strain relaxation of pseudomorphic Si1−xGex/Si(100) heterostructures
Authors
Keywords
-
Journal
JOURNAL OF APPLIED PHYSICS
Volume 105, Issue 11, Pages 114905
Publisher
AIP Publishing
Online
2009-06-04
DOI
10.1063/1.3139274

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