Stress-induced phenomena in nanosized copper interconnect structures studied by x-ray and electron microscopy

Published 2009 View Full Article

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Title
Stress-induced phenomena in nanosized copper interconnect structures studied by x-ray and electron microscopy
Authors
Keywords
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Journal
JOURNAL OF APPLIED PHYSICS
Volume 106, Issue 9, Pages 093711
Publisher
AIP Publishing
Online
2009-11-12
DOI
10.1063/1.3254166
References
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