4.6 Article

Photoinduced resistivity change of electron-doped La0.8Te0.2MnO3 film

Journal

JOURNAL OF APPLIED PHYSICS
Volume 105, Issue 3, Pages -

Publisher

AMER INST PHYSICS
DOI: 10.1063/1.3077183

Keywords

colossal magnetoresistance; doping; electrical resistivity; lanthanum compounds; magnetic thin films; metal-insulator transition; photoelectricity; polarons; pulsed laser deposition; strontium compounds; tellurium compounds

Funding

  1. National Natural Science Foundation of China [60171034]

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In this paper, electron-doped La0.8Te0.2MnO3 film has been prepared on SrTiO3 (100) substrate by pulsed laser deposition method, and the photoinduced resistivity change and colossal magnetoresistance effect have been investigated. The results show that the film has a high metal-insulator transition temperature T-MI of similar to 283 K and the maximum magnetoresistance ratio is similar to 24% at 0.7 T. Under laser irradiation, T-MI varies from 283 to 243 K and resistivity increases below T-MI, while it decreases above T-MI. The maximum photoinduced resistivity change in resistivity (LR%) is 134.8%. The photoinduced relaxation character of the film indicates that the relaxation of photoinduced character relates to the excitation of small polarons.

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