Plasma-chemical processes in microwave plasma-enhanced chemical vapor deposition reactors operating with C/H/Ar gas mixtures

Published 2008 View Full Article

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Title
Plasma-chemical processes in microwave plasma-enhanced chemical vapor deposition reactors operating with C/H/Ar gas mixtures
Authors
Keywords
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Journal
JOURNAL OF APPLIED PHYSICS
Volume 104, Issue 11, Pages 113304
Publisher
AIP Publishing
Online
2008-12-12
DOI
10.1063/1.3035850
References
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