Boron activation and diffusion in silicon and strained silicon-on-insulator by rapid thermal and flash lamp annealings

Published 2008 View Full Article

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Title
Boron activation and diffusion in silicon and strained silicon-on-insulator by rapid thermal and flash lamp annealings
Authors
Keywords
-
Journal
JOURNAL OF APPLIED PHYSICS
Volume 104, Issue 4, Pages 044908
Publisher
AIP Publishing
Online
2008-09-02
DOI
10.1063/1.2968462

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