Dependences of nitrogen incorporation behaviors on the crystallinity and phase distribution of atomic layer deposited Hf-silicate films with various Si concentrations

Title
Dependences of nitrogen incorporation behaviors on the crystallinity and phase distribution of atomic layer deposited Hf-silicate films with various Si concentrations
Authors
Keywords
-
Journal
JOURNAL OF APPLIED PHYSICS
Volume 104, Issue 5, Pages 054101
Publisher
AIP Publishing
Online
2008-09-04
DOI
10.1063/1.2973674

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