Effect of phase transition in shock-recovered silicon

A series of shock-recovery experiments on a single crystal of silicon up to 38 GPa and characterizations of the recovered samples by x-ray diffraction analysis, Raman spectroscopy, and microscopic observations were performed for a better understanding of residual effects after shock loading by using a propellant gun. The x-ray diffraction trace of each sample revealed the absence of additional constituents including metastable phases and high-pressure phases of silicon except for 11 and 38 GPa. At 11 GPa, small amounts of metastable phases of silicon were obtained. The formation of copper silicide (Cu3Si) was confirmed in the sample shocked at 38 GPa. Considering the surface morphology revealed by microscopic observation, a thermochemical reaction through the melting of silicon resulted in the formation of Cu3Si. An additional band and the center frequency deviation of a peak were shown in the Raman spectroscopy results. The results of x-ray diffraction and Raman spectroscopy indicated that crystalline size reduction rather than the formation of metastable phases occurred. Structural deformation rather than the thermal effect caused by a shock-induced temperature rise may be responsible for the disappearance of metastable phases, which were observed in other high-pressure experiments. (c) 2008 American Institute of Physics.