Journal
JOURNAL OF APPLIED ELECTROCHEMISTRY
Volume 41, Issue 11, Pages 1287-1294Publisher
SPRINGER
DOI: 10.1007/s10800-011-0340-x
Keywords
Tin films; RF sputtering; Electrochemical lithiation; Surface roughness
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Funding
- Defense Research Development Organization (DRDO), Government of India
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Thin films of Sn were deposited on Pt/Si substrates by sputtering technique and subjected to electrochemical lithiation studies. Electrochemical lithiation of Sn resulted in the formation of Sn-Li alloys of different compositions. Charging of Sn-coated Pt/Si electrodes was terminated at different potentials and the electrodes were examined for physicochemical properties. The scanning electron microscopy and atomic force microscopy images suggested that the Sn films expanded on lithiation. Roughness of the film increased with an increase in the quantity of Li present in Sn-Li alloy. Electrochemical impedance data suggested that the kinetics of charging became sluggish with an increase in the quantity of Li in Sn-Li alloy.
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