4.4 Article

The effect of electrochemical lithiation on physicochemical properties of RF-sputtered Sn thin films

Journal

JOURNAL OF APPLIED ELECTROCHEMISTRY
Volume 41, Issue 11, Pages 1287-1294

Publisher

SPRINGER
DOI: 10.1007/s10800-011-0340-x

Keywords

Tin films; RF sputtering; Electrochemical lithiation; Surface roughness

Funding

  1. Defense Research Development Organization (DRDO), Government of India

Ask authors/readers for more resources

Thin films of Sn were deposited on Pt/Si substrates by sputtering technique and subjected to electrochemical lithiation studies. Electrochemical lithiation of Sn resulted in the formation of Sn-Li alloys of different compositions. Charging of Sn-coated Pt/Si electrodes was terminated at different potentials and the electrodes were examined for physicochemical properties. The scanning electron microscopy and atomic force microscopy images suggested that the Sn films expanded on lithiation. Roughness of the film increased with an increase in the quantity of Li present in Sn-Li alloy. Electrochemical impedance data suggested that the kinetics of charging became sluggish with an increase in the quantity of Li in Sn-Li alloy.

Authors

I am an author on this paper
Click your name to claim this paper and add it to your profile.

Reviews

Primary Rating

4.4
Not enough ratings

Secondary Ratings

Novelty
-
Significance
-
Scientific rigor
-
Rate this paper

Recommended

No Data Available
No Data Available