Quantitative depth profiling of boron and arsenic ultra low energy implants by pulsed rf-GD-ToFMS

Title
Quantitative depth profiling of boron and arsenic ultra low energy implants by pulsed rf-GD-ToFMS
Authors
Keywords
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Journal
JOURNAL OF ANALYTICAL ATOMIC SPECTROMETRY
Volume 26, Issue 3, Pages 542-549
Publisher
Royal Society of Chemistry (RSC)
Online
2010-12-22
DOI
10.1039/c0ja00197j

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