Journal
NANOSCALE RESEARCH LETTERS
Volume 10, Issue -, Pages -Publisher
SPRINGEROPEN
DOI: 10.1186/s11671-015-1019-8
Keywords
Low temperature; PECVD; Vertical graphene nanosheets; Glass substrate; Copper-assisted growth
Funding
- Basic Science Research Program through National Research Foundation of Korea (NRF) - Ministry of Education, Science and Technology [2011-0006268]
- MKE (The Ministry of Knowledge Economy), Korea under ITRC (Information Technology Research Center) [NIPA-2012-H0301-12-4013]
- Ministry of Public Safety & Security (MPSS), Republic of Korea [H8501-15-1009] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
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Vertical graphene (VG) nanosheets are directly grown below 500 A degrees C on glass substrates by a one-step copper-assisted plasma-enhanced chemical vapour deposition (PECVD) process. A piece of copper foil is located around a glass substrate as a catalyst in the process. The effect of the copper catalyst on the vertical graphene is evaluated in terms of film morphology, growth rate, carbon density in the plasma and film resistance. The growth rate of the vertical graphene is enhanced by a factor of 5.6 with the copper catalyst with denser vertical graphene. The analysis of optical emission spectra suggests that the carbon radical density is increased with the copper catalyst. Highly conductive VG films having 800 Omega/a- are grown on glass substrates with Cu catalyst at a relatively low temperature.
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