A tunable sub-100 nm silicon nanopore array with an AAO membrane mask: reducing unwanted surface etching by introducing a PMMA interlayer

Title
A tunable sub-100 nm silicon nanopore array with an AAO membrane mask: reducing unwanted surface etching by introducing a PMMA interlayer
Authors
Keywords
-
Journal
Nanoscale
Volume 7, Issue 32, Pages 13489-13494
Publisher
Royal Society of Chemistry (RSC)
Online
2015-07-22
DOI
10.1039/c5nr02786a

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