Journal
NANOSCALE
Volume 7, Issue 22, Pages 9970-9974Publisher
ROYAL SOC CHEMISTRY
DOI: 10.1039/c5nr01206f
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Funding
- A*STAR (Agency for Science, Technology and Research) Institute of Materials Research and Engineering (IMRE) Singapore
- MESA+ Institute for Nanotechnology of the University of Twente
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Nanoelectrochemical patterning of redox responsive organometallic poly(ferrocenylsilane) (PFS) multilayers is demonstrated by electrochemical dip pen lithography (EDPN). Local electrochemical oxidation and Joule heating of PFS multilayers from the tip are considered as relevant mechanisms related to structure generation. The influence of applied bias potential, tip velocity, and multilayer thickness on the pattern height and width were investigated.
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