The influence of H2/Ar ratio on Ge content of the μc-SiGe:H films deposited by PECVD

Published 2010 View Full Article

  1. Home
  2. Publications
  3. Publication Search
  4. Publication Details
Title
The influence of H2/Ar ratio on Ge content of the μc-SiGe:H films deposited by PECVD
Authors
Keywords
-
Journal
JOURNAL OF ALLOYS AND COMPOUNDS
Volume 504, Issue 2, Pages 403-406
Publisher
Elsevier BV
Online
2010-06-09
DOI
10.1016/j.jallcom.2010.05.128

Ask authors/readers for more resources

Protocol

Community support

Reagent

Community support

Reprint

Contact the author

Find the ideal target journal for your manuscript

Explore over 38,000 international journals covering a vast array of academic fields.

Search

Create your own webinar

Interested in hosting your own webinar? Check the schedule and propose your idea to the Peeref Content Team.

Create Now
Webinars Posters Questions Hubs Funding Journals Articles Connect Collections Reviewers About Us FAQs Mobile App Privacy Policy Terms of Use
© Peeref 2019-2024. All rights reserved.