4.7 Article

Effects of citric acid on properties of single phase CuAlO2 thin films derived by chemical solution deposition

Journal

JOURNAL OF ALLOYS AND COMPOUNDS
Volume 487, Issue 1-2, Pages 404-408

Publisher

ELSEVIER SCIENCE SA
DOI: 10.1016/j.jallcom.2009.07.149

Keywords

Chemical solution deposition; CuAlO2 thin films; Morphology; Optical-electrical property; Citric acid

Funding

  1. National Key Basic Research [2007CB925002]
  2. National Nature Science Foundation of China [10774146, 50802096]
  3. Anhui Province NSF [070414162]
  4. Director's Fund of Hefei Institutes of Physical Science
  5. Chinese Academy of Sciences

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Single phase CuAlO2 thin films were first successfully prepared on (00 01) sapphire substrates by chemical solution deposition method. Additionally, in order to improve the transmittance and conductivity of single phase CuAlO2 thin films, effects of citric acid as additive on phase structure, morphology and optical-electrical property of CuAlO2 thin films were investigated. Appropriate contents of citric acid do not inhibit the formation of single phase CuAlO2 thin films, and are also in favor of improvement of transmittance. Excessive citric acid not only introduces secondary phases, but also deteriorates the quality of the film surface. The mean transmittance in visible region is approximately 50% in the film prepared with 5 unit contents of citric acid and its direct and indirect optical band gaps are 3.24 eV and 1.8 eV, respectively. The films with or without citric acid behave like semiconductors. The resistivity and the activation energy of the film prepared with 5 unit contents of citric acid are evaluated as 2.5 x 10(2) Omega cm at 290 K and 300.5 meV, respectively. (C) 2009 Elsevier B.V. All rights reserved.

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