Effects of substrate bias and nitrogen flow ratio on the resistivity, composition, crystal structure, and reflectance of reactively sputtered hafnium-nitride film

Title
Effects of substrate bias and nitrogen flow ratio on the resistivity, composition, crystal structure, and reflectance of reactively sputtered hafnium-nitride film
Authors
Keywords
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Journal
JOURNAL OF ALLOYS AND COMPOUNDS
Volume 486, Issue 1-2, Pages 649-652
Publisher
Elsevier BV
Online
2009-07-12
DOI
10.1016/j.jallcom.2009.07.023

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