Growth of TiO2 thin film by reactive RF magnetron sputtering using oxygen radical

Published 2007 View Full Article

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Title
Growth of TiO2 thin film by reactive RF magnetron sputtering using oxygen radical
Authors
Keywords
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Journal
JOURNAL OF ALLOYS AND COMPOUNDS
Volume 449, Issue 1-2, Pages 375-378
Publisher
Elsevier BV
Online
2007-01-27
DOI
10.1016/j.jallcom.2006.02.103

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