Characterization of silicon nitride thin films deposited by reactive sputtering and plasma-enhanced CVD at low temperatures

Published 2014 View Full Article

  1. Home
  2. Publications
  3. Publication Search
  4. Publication Details
Title
Characterization of silicon nitride thin films deposited by reactive sputtering and plasma-enhanced CVD at low temperatures
Authors
Keywords
-
Journal
JAPANESE JOURNAL OF APPLIED PHYSICS
Volume 53, Issue 5S2, Pages 05GE01
Publisher
Japan Society of Applied Physics
Online
2014-04-16
DOI
10.7567/jjap.53.05ge01

Ask authors/readers for more resources

Protocol

Community support

Reagent

Community support

Reprint

Contact the author

Discover Peeref hubs

Discuss science. Find collaborators. Network.

Join a conversation

Find the ideal target journal for your manuscript

Explore over 38,000 international journals covering a vast array of academic fields.

Search
Webinars Posters Questions Hubs Funding Journals Articles Connect Collections Reviewers About Us FAQs Mobile App Privacy Policy Terms of Use
© Peeref 2019-2024. All rights reserved.