Review of plasma-enhanced atomic layer deposition: Technical enabler of nanoscale device fabrication

Published 2014 View Full Article

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Title
Review of plasma-enhanced atomic layer deposition: Technical enabler of nanoscale device fabrication
Authors
Keywords
-
Journal
JAPANESE JOURNAL OF APPLIED PHYSICS
Volume 53, Issue 3S2, Pages 03DA01
Publisher
IOP Publishing
Online
2014-03-05
DOI
10.7567/jjap.53.03da01

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