Effects of postdeposition annealing on the metal–insulator transition of VO2−xthin films prepared by RF magnetron sputtering

Title
Effects of postdeposition annealing on the metal–insulator transition of VO2−xthin films prepared by RF magnetron sputtering
Authors
Keywords
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Journal
JAPANESE JOURNAL OF APPLIED PHYSICS
Volume 53, Issue 3, Pages 033201
Publisher
IOP Publishing
Online
2014-02-24
DOI
10.7567/jjap.53.033201

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