Moisture Barrier Properties of Al2O3Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures

Published 2013 View Full Article

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Title
Moisture Barrier Properties of Al2O3Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
Authors
Keywords
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Journal
JAPANESE JOURNAL OF APPLIED PHYSICS
Volume 52, Issue 3R, Pages 035502
Publisher
IOP Publishing
Online
2013-03-02
DOI
10.7567/jjap.52.035502

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