Article
Engineering, Electrical & Electronic
Zhiyuan Bai, Song Chai, Chenchen Zhao, Liwei Wang
Summary: An experiment was conducted to study P-GaN gate AlGaN/GaN heterostructure field-effect transistors with gate-connected P-AlGaN field plates (PAFP-HFETs) using experimentally calibrated technology computer-aided design (TCAD) simulation. The results showed that the P-AlGaN field plates improved the distribution of an electric field, suppressed electric field crowding at the gate, and significantly enhanced the breakdown voltage (BV). The optimized PAFP-HFET achieved a Baliga figure-of-merit (BFOM) of 2.4 GW/cm(2).
JOURNAL OF ELECTRONIC MATERIALS
(2023)
Article
Chemistry, Physical
Fobao Huang, Jianghua Chen, Yiluo Ding, Wei Huang
Summary: The study explores the impact of the piezotronic effect and other effects on the two-dimensional electron gas (2DEG) in third-generation semiconductors. The results demonstrate that stress, induced by piezoelectric polarization, can effectively control the electron concentration of the 2DEG. Furthermore, the piezotronic effect can increase the density of states and enhance the Rashba spin-orbit coupling in wide-gap piezoelectric semiconductors.
Article
Engineering, Electrical & Electronic
Jiarui Guo, Yan Gu, Yushen Liu, Fangzhou Liang, Wei Chen, Feng Xie, Xifeng Yang, Weiying Qian, Xiangyang Zhang, Guoqing Chen, Guofeng Yang
Summary: This study designs a UV photodetector that utilizes a two-dimensional electron gas at the AlGaN/GaN interface with an AlGaN symmetrical interdigital structure. The AlGaN interdigital structure is fabricated with a Ti/Al/Ti/Au metal stack for ohmic contacts. The interdigital AlGaN/GaN heterostructure enhances the polarization electric field in the GaN absorption layer, facilitating the separation and transport of photogenerated carriers. The polarization-enhanced physical mechanism of the AlGaN/GaN 2DEG UV PD is explored through theoretical simulations. The designed UV PD exhibits a broadband characteristic with a response spectra from 300 to 365 nm and a cutoff wavelength of 365 nm, matching the bandgap wavelength of GaN. The normalized photocurrent-to-dark current ratio (NPDR) of 1.31 x 10(9) W-1 is measured at 10 V.
IEEE TRANSACTIONS ON ELECTRON DEVICES
(2023)
Article
Multidisciplinary Sciences
Yang Liu, Yuanjie Lv, Shuoshuo Guo, Zhengfang Luan, Aijie Cheng, Zhaojun Lin, Yongxiong Yang, Guangyuan Jiang, Yan Zhou
Summary: The study showed that the AlGaN/GaN heterostructure field-effect transistor based on open-gate technology can easily modulate the threshold voltage range by changing the width of the opening. The open-gate device has two different conductance modes and can modulate the open-channel current by changing the gate-source voltage.
SCIENTIFIC REPORTS
(2021)
Article
Nanoscience & Nanotechnology
Yi-Yu Zhang, Shu An, Yixiong Zheng, Junyu Lai, Jung-Hun Seo, Kwang Hong Lee, Munho Kim
Summary: This study demonstrates a novel method for transferring flexible AlGaN/GaN HEMTs from insulating substrates to flexible ones, achieving good electrical performance and piezoelectric behavior. Mechanical bending can further enhance the performance of AlGaN/GaN HEMTs. The results show great potential for this device in next-generation flexible electronics applications.
ADVANCED ELECTRONIC MATERIALS
(2022)
Article
Physics, Multidisciplinary
Andrew W. Gunn, Makhluk Hossain Prio, Durga Gajula, Goutam Koley
Summary: This study investigates photon-assisted trapping and detrapping of electrons injected from the gate in a heterostructure field-effect transistor (HFET) under negative bias. It is found that sub-bandgap laser illumination significantly affects the electron injection rate from the gate. The trapped electrons reduce the density of the two-dimensional electron gas (2DEG) at the AlGaN/GaN heterointerface but can be emitted by sub-bandgap photons, leading to a recovery of 2DEG density. The trapping and detrapping dynamics depend on the wavelength and focal position of the laser, as well as the gate bias stress time prior to HFET illumination.
Article
Physics, Multidisciplinary
Honghui Liu, Zhiwen Liang, Fengge Wang, Yanyan Xu, Xien Yang, Yisheng Liang, Xin Li, Lizhang Lin, Zhisheng Wu, Yang Liu, Baijun Zhang
Summary: This study successfully fabricated lateral Schottky barrier diodes with small capacitance and low turn-on voltage on n-GaN and AlGaN/GaN heterostructure. The lateral SBDs exhibited significantly reduced capacitance without sacrificing performance in terms of on-resistance and reverse leakage current. Additionally, the V(on) of lateral AlGaN/GaN SBD was reduced compared to planar SBD due to direct contact between the anode metal and the two-dimensional electron gas.
FRONTIERS IN PHYSICS
(2022)
Article
Physics, Applied
Yat Hon Ng, Zheyang Zheng, Li Zhang, Ruizi Liu, Tao Chen, Sirui Feng, Qiming Shao, Kevin J. Chen
Summary: This study investigates the hole distribution and transport in the p-GaN/AlGaN/GaN heterostructure through experimental measurements and simulations. The results show that the p-channel of this structure is composed of bulk holes in the p-GaN and a two-dimensional hole gas (2DHG) at the p-GaN/AlGaN interface. Both components contribute significantly to lateral p-type conduction at room temperature. The complementary temperature responses of these components enhance conductivity at both high and low temperatures.
APPLIED PHYSICS LETTERS
(2023)
Article
Engineering, Electrical & Electronic
Yixu Yao, Sen Huang, Qimeng Jiang, Xinhua Wang, Lan Bi, Wen Shi, Fuqiang Guo, Tiantian Luan, Jie Fan, Haibo Yin, Ke Wei, Yingkui Zheng, Jingyuan Shi, Yankui Li, Qian Sun, Xinyu Liu
Summary: A drain-controlled current-mode deep level transient spectroscopy (I-DLTS) was developed to investigate the Semi-ON-state current collapse in AlGaN/GaN high electron mobility transistors (HEMTs). By inserting a graded AlGaN back-barrier, the charging of buffer traps induced by hot-electron effect was effectively blocked, resulting in a suppressed current collapse in AlGaN/GaN HEMTs under Semi-ON-state stress.
IEEE ELECTRON DEVICE LETTERS
(2022)
Article
Optics
Gang Wu, Libin Tang, Gongrong Deng, Lining Liu, Qun Hao, Shouzhang Yuan, Jingyu Wang, Hong Wei, Yupeng Zhao, Biao Yue, Jingmei Shi, Ying Tan, Rujie Li, Yiyun Zhang, Jianchang Yan, Xiaoyan Yi, Junxi Wang, Jincheng Kong, Jinmin Li
Summary: This paper reports a concept of using graphene/p-GaN Schottky heterojunction to achieve dual-band ultraviolet photodetection. The photodetector demonstrates high performance, dual functionalities, and multifunctional design.
Article
Engineering, Electrical & Electronic
David Maria Tobaldi, Valentina Trimini, Arianna Creti, Mauro Lomascolo, Stefano Dicorato, Maria Losurdo, Adriana Passaseo, Vittorianna Tasco
Summary: The study successfully developed a remote plasma MOCVD method for epitaxial growth of high-quality GaN/AlGaN heterostructures. This method has lower growth temperature and uses remote plasma instead of ammonia, providing a cost-effective and green approach for high-quality heteroepitaxy.
ACS APPLIED ELECTRONIC MATERIALS
(2021)
Article
Engineering, Electrical & Electronic
Huy-Binh Do, Jinggui Zhou, Maria Merlyne De Souza
Summary: This study reports the influence of the thickness of an undoped GaN (u-GaN) layer on the current transport through the metal/p++GaN contact to a 2DHG in a GaN/AlGaN/GaN heterostructure. The current is mainly controlled by an internal potential barrier, which increases with thickness within a certain range and then remains constant. The study also reports a nonideality factor for the tunneling current through the p+ GaN/u-GaN to the 2DHG. Additionally, the contact resistivity and hole mobility of the metal stack on the GaN/AlGaN/GaN heterostructure are found to be the best-in-class among reported results.
ACS APPLIED ELECTRONIC MATERIALS
(2022)
Article
Materials Science, Ceramics
Kai Chen, Yachao Zhang, Jincheng Zhang, Xing Wang, Yixin Yao, Jinbang Ma, Yue Hao
Summary: By analyzing the growth modes of GaN films on AlN buffer layers with different thicknesses, a new growth model of GaN on AlN buffer was proposed in this study. Under optimal conditions, AlGaN/GaN/AlN heterostructures showed excellent performance.
CERAMICS INTERNATIONAL
(2022)
Article
Crystallography
Xiaobiao Han, Wang Lin, Qiliang Wang, Shaoheng Cheng, Liuan Li, Liang He
Summary: In this paper, a novel p-GaN/AlGaN/GaN HFET with re-grown AlGaN is designed using Silvaco TCAD. The thin AlGaN barrier beneath the p-GaN positively shifts the threshold voltage to achieve normally-off operation, but it reduces the drain current due to low 2DEG concentration. The re-grown AlGaN barrier in the access regions partially recovers the 2DEG concentration and enhances the drain current. Furthermore, the field plate structure formed during the AlGaN re-growth process effectively suppresses electric field crowding and premature breakdown. By optimizing device parameters, a normally-off p-GaN/ AlGaN/GaN HFET with balanced output current, threshold voltage, and breakdown voltage is designed.
JOURNAL OF CRYSTAL GROWTH
(2023)
Article
Nanoscience & Nanotechnology
Seokho Moon, Sung-Jae Chang, Youngjae Kim, Odongo Francis Ngome Okello, Jiye Kim, Jaewon Kim, Hyun-Wook Jung, Ho-Kyun Ahn, Dong-Seok Kim, Si-Young Choi, JaeDong Lee, Jong-Won Lim, Jong Kyu Kim
Summary: This study successfully demonstrated the realization of wafer-scale h-BN van der Waals heterostructure on a 2 in. AlGaN/GaN high-electron mobility transistor (HEMT) wafer using metal-organic chemical vapor deposition, showing promising performance of the fabricated HEMT with h-BN. Advanced microscopic and spectroscopic analyses along with theoretical calculations revealed an atomically sharp heterointerface with very weak van der Waals interaction between the approximately 2.5 nm-thick h-BN and AlGaN layers. These findings pave the way for practical implementation of 2D materials integrated with conventional microelectronic devices, leading towards the realization of future all-2D electronics.
ACS APPLIED MATERIALS & INTERFACES
(2021)
Article
Physics, Applied
Kenta Watanabe, Daiki Terashima, Mikito Nozaki, Takahiro Yamada, Satoshi Nakazawa, Masahiro Ishida, Yoshiharu Anda, Tetsuzo Ueda, Akitaka Yoshigoe, Takuji Hosoi, Takayoshi Shimura, Heiji Watanabe
JAPANESE JOURNAL OF APPLIED PHYSICS
(2018)
Article
Physics, Applied
Hajime Ishii, Hiroaki Ueno, Tetsuzo Ueda, Tetsuo Endoh
JAPANESE JOURNAL OF APPLIED PHYSICS
(2018)
Article
Physics, Applied
Takahiro Yamada, Kenta Watanabe, Mikito Nozaki, Hong-An Shih, Satoshi Nakazawa, Yoshiharu Anda, Tetsuzo Ueda, Akitaka Yoshigoe, Takuji Hosoi, Takayoshi Shimura, Heiji Watanabe
JAPANESE JOURNAL OF APPLIED PHYSICS
(2018)
Article
Physics, Applied
Mikito Nozaki, Kenta Watanabe, Takahiro Yamada, Hong-An Shih, Satoshi Nakazawa, Yoshiharu Anda, Tetsuzo Ueda, Akitaka Yoshigoe, Takuji Hosoi, Takayoshi Shimura, Heiji Watanabe
JAPANESE JOURNAL OF APPLIED PHYSICS
(2018)
Article
Engineering, Electrical & Electronic
Elena Fabris, Matteo Meneghini, Carlo De Santi, Matteo Borga, Yusuke Kinoshita, Kenichiro Tanaka, Hidetoshi Ishida, Tetsuzo Ueda, Gaudenzio Meneghesso, Enrico Zanoni
IEEE TRANSACTIONS ON ELECTRON DEVICES
(2019)
Article
Physics, Applied
Satoshi Nakazawa, Hong-An Shih, Naohiro Tsurumi, Yoshiharu Anda, Tsuguyasu Hatsuda, Tetsuzo Ueda, Tsunenobu Kimoto, Tamotsu Hashizume
JAPANESE JOURNAL OF APPLIED PHYSICS
(2019)
Article
Physics, Applied
Tetsuzo Ueda
JAPANESE JOURNAL OF APPLIED PHYSICS
(2019)
Article
Engineering, Electrical & Electronic
Yuta Yanagisawa, Yushi Miura, Hiroyuki Handa, Tetsuzo Ueda, Toshifumi Ise
IEEE TRANSACTIONS ON POWER ELECTRONICS
(2019)
Proceedings Paper
Engineering, Electrical & Electronic
Kenichiro Tanaka, Masahiro Hikita, Tetsuzo Ueda
2019 IEEE INTERNATIONAL RELIABILITY PHYSICS SYMPOSIUM (IRPS)
(2019)
Proceedings Paper
Engineering, Electrical & Electronic
Ayanori Ikoshi, Masahiro Toki, Hiroto Yamagiwa, Daijiro Arisawa, Masahiro Hikita, Kazuki Suzuki, Manabu Yanagihara, Yasuhiro Uemoto, Kenichiro Tanaka, Tetsuzo Ueda
2018 IEEE INTERNATIONAL RELIABILITY PHYSICS SYMPOSIUM (IRPS)
(2018)
Proceedings Paper
Engineering, Electrical & Electronic
Atsushi Ohoka, Masao Uchida, Tsutomu Kiyosawa, Nobuyuki Horikawa, Kouichi Saitou, Yoshihiko Kanzawa, Haruyuki Sorada, Kazuyuki Sawada, Tetsuzo Ueda
PRODCEEDINGS OF THE 2018 IEEE 30TH INTERNATIONAL SYMPOSIUM ON POWER SEMICONDUCTOR DEVICES AND ICS (ISPSD)
(2018)
Proceedings Paper
Energy & Fuels
Yuta Yanagisawa, Yushi Miura, Hiroyuki Handa, Tetsuzo Ueda, Toshifumi Ise
2018 IEEE ENERGY CONVERSION CONGRESS AND EXPOSITION (ECCE)
(2018)
Proceedings Paper
Materials Science, Multidisciplinary
Daisuke Shibata, Ryo Kajitani, Hiroyuki Handa, Nanako Shiozaki, Shinji Ujita, Masahiro Ogawa, Kenichiro Tanaka, Satoshi Tamura, Tsuguyasu Hatsuda, Masahiro Ishida, Tetsuzo Ueda
GALLIUM NITRIDE MATERIALS AND DEVICES XIII
(2018)
Proceedings Paper
Energy & Fuels
Yuta Yanagisawa, Yushi Miura, Hiroyuki Handa, Tetsuzo Ueda, Toshifumi Ise
2018 INTERNATIONAL POWER ELECTRONICS CONFERENCE (IPEC-NIIGATA 2018 -ECCE ASIA)
(2018)
Proceedings Paper
Engineering, Electrical & Electronic
Hidekazu Umeda, Yasuhiro Yamada, Kenichi Asanuma, Fumito Kusama, Yusuke Kinoshita, Hiroaki Ueno, Hidetoshi Ishida, Tsuguyasu Hatsuda, Tetsuzo Ueda
THIRTY-THIRD ANNUAL IEEE APPLIED POWER ELECTRONICS CONFERENCE AND EXPOSITION (APEC 2018)
(2018)