Development of Cu Etching Using O2Cluster Ion Beam under Acetic Acid Gas Atmosphere

Published 2013 View Full Article

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Title
Development of Cu Etching Using O2Cluster Ion Beam under Acetic Acid Gas Atmosphere
Authors
Keywords
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Journal
JAPANESE JOURNAL OF APPLIED PHYSICS
Volume 51, Issue 8S1, Pages 08HA02
Publisher
Japan Society of Applied Physics
Online
2013-12-21
DOI
10.7567/jjap.51.08ha02

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