☆ 4.3 Article

Effects of Surface Temperature on High-Rate Etching of Silicon by Narrow-Gap Microwave Hydrogen Plasma

JAPANESE JOURNAL OF APPLIED PHYSICS (2013)

Journal

JAPANESE JOURNAL OF APPLIED PHYSICS

Volume 51, Issue 10S, Pages 10NA09

Publisher

Japan Society of Applied Physics

DOI: 10.7567/jjap.51.10na09

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Categories

Physics, Applied

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