Isobutyl Silane Precursors for SiCH Low-kCap Layer beyond the 22 nm Node: Analysis of Film Structure for Compatibility of Lowerk-value and High Barrier Properties

Published 2011 View Full Article

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Title
Isobutyl Silane Precursors for SiCH Low-kCap Layer beyond the 22 nm Node: Analysis of Film Structure for Compatibility of Lowerk-value and High Barrier Properties
Authors
Keywords
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Journal
JAPANESE JOURNAL OF APPLIED PHYSICS
Volume 50, Issue 5, Pages 05EB01
Publisher
Japan Society of Applied Physics
Online
2011-05-20
DOI
10.1143/jjap.50.05eb01

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