☆ 4.3 Article

Influence of Surrounding Dielectrics on the Data Retention Time of Doped Sb2Te Phase Change Material

JAPANESE JOURNAL OF APPLIED PHYSICS (2011)

Journal

JAPANESE JOURNAL OF APPLIED PHYSICS

Volume 50, Issue 2, Pages -

Publisher

IOP PUBLISHING LTD

DOI: 10.1143/JJAP.50.024102

Keywords

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Categories

Physics, Applied

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Abstract

The crystallization properties of as-deposited and laser written amorphous marks of doped Sb2Te phase change material are found to be only dependent on the top dielectric layer. A ZnS:SiO2 top dielectric layer yields a higher crystallization temperature and a larger crystal growth activation energy as compared to a SiO2 top dielectric layer, leading to superior data retention times at ambient temperatures. The observed correlation between the larger crystallization temperatures and larger crystal growth activation energies indicates that the viscosity of the phase change material in the amorphous state is dependent on the interfacial energy between the phase change material and the top dielectric layer. (C) 2011 The Japan Society of Applied Physics

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