Influence of Silicon Doping on the Properties of Sputtered Ge2Sb2Te5Thin Film

Title
Influence of Silicon Doping on the Properties of Sputtered Ge2Sb2Te5Thin Film
Authors
Keywords
-
Journal
JAPANESE JOURNAL OF APPLIED PHYSICS
Volume 48, Issue 4, Pages 045503
Publisher
Japan Society of Applied Physics
Online
2009-04-20
DOI
10.1143/jjap.48.045503

Ask authors/readers for more resources

Discover Peeref hubs

Discuss science. Find collaborators. Network.

Join a conversation

Publish scientific posters with Peeref

Peeref publishes scientific posters from all research disciplines. Our Diamond Open Access policy means free access to content and no publication fees for authors.

Learn More