Effect of Oxide Charge Trapping on X-ray Photoelectron Spectroscopy of HfO2/SiO2/Si Structures

Published 2009 View Full Article

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Title
Effect of Oxide Charge Trapping on X-ray Photoelectron Spectroscopy of HfO2/SiO2/Si Structures
Authors
Keywords
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Journal
JAPANESE JOURNAL OF APPLIED PHYSICS
Volume 48, Issue 4, Pages 041201
Publisher
Japan Society of Applied Physics
Online
2009-04-20
DOI
10.1143/jjap.48.041201

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