Fabrication of High-Intensity Light-Emitting Diodes Using Nanostructures by Ultraviolet Nanoimprint Lithography and Electrodeposition

Title
Fabrication of High-Intensity Light-Emitting Diodes Using Nanostructures by Ultraviolet Nanoimprint Lithography and Electrodeposition
Authors
Keywords
-
Journal
JAPANESE JOURNAL OF APPLIED PHYSICS
Volume 47, Issue 2, Pages 933-935
Publisher
Japan Society of Applied Physics
Online
2008-02-15
DOI
10.1143/jjap.47.933

Ask authors/readers for more resources

Find Funding. Review Successful Grants.

Explore over 25,000 new funding opportunities and over 6,000,000 successful grants.

Explore

Find the ideal target journal for your manuscript

Explore over 38,000 international journals covering a vast array of academic fields.

Search