Low Voltage Operation of High-κ HfO2/TiO2/Al2O3Single Quantum Well for Nanoscale Flash Memory Device Applications

Published 2008 View Full Article

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Title
Low Voltage Operation of High-κ HfO2/TiO2/Al2O3Single Quantum Well for Nanoscale Flash Memory Device Applications
Authors
Keywords
-
Journal
JAPANESE JOURNAL OF APPLIED PHYSICS
Volume 47, Issue 3, Pages 1818-1821
Publisher
Japan Society of Applied Physics
Online
2008-03-16
DOI
10.1143/jjap.47.1818

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