4.3 Article

Fabrication of Sub-100 nm Sized Patterns on Curved Acryl Substrate Using a Flexible Stamp

Journal

JAPANESE JOURNAL OF APPLIED PHYSICS
Volume 47, Issue 5, Pages 3699-3701

Publisher

JAPAN SOCIETY APPLIED PHYSICS
DOI: 10.1143/JJAP.47.3699

Keywords

curved substrate; flexible stamp; nickel foil stamp; hot embossing; nanoimprint

Funding

  1. Korean Government (MOEHRD) [KRF-2005-003-D00142]
  2. Gwangju KITECH
  3. National Research Foundation of Korea [과C6A2001, 2007-00493] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)

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As small as 100nm patterns were successfully transferred onto a non-planar acryl substrate using both UV nanoimprinting and hot embossing techniques. Two different types of flexible imprint stamps, electroformed nickel foil stamp and molded water soluble poly(vinyl alcohol) (PVA) stamp, were used. 100 nm line and space pattern of Si master was successfully transferred to nickel foil stamp and PVA stamp and their patterns were also transferred to the surface of curved acryl substrate using either UV nanoimprint lithography or hot embossing lithography. [DOI: 10.1143/JJAP.47.3699]

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