4.3 Article Proceedings Paper

Proposal of a metal-oxide-semiconductor silicon optical modulator based on inversion-carrier absorption

Journal

JAPANESE JOURNAL OF APPLIED PHYSICS
Volume 47, Issue 4, Pages 2906-2909

Publisher

IOP PUBLISHING LTD
DOI: 10.1143/JJAP.47.2906

Keywords

silicon optical modulator; inversion-carrier absorption; MOS capacitor; SOI

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A novel silicon optical modulator, originally based on inversion-carrier absorption, with a metal-oxide-semiconductor capacitor structure has been proposed and successfully developed. In this report, we will describe experimental results for a modulator that is fabricated on a silicon-on-insulator (SOI) substrate. The device consists of a 2- to 5-mm-long and 1.5- mu m-thick (110) SOI core and a surrounding clad of 1.0-mu m-thick buried oxide underneath and doped polysilicon on top. Infrared light absorption by inversion carriers is not large enough in the 1.55 mu m wavelength regime. However, an optical response of 0.24% at a gate voltage of 11.5 V is obtained. Preliminary analysis has been also conducted for the potentiality of the optical modulator based on inversion-carrier absorption. It is predicted that this modulator will be more effective in deeper infrared regions unlike other modulators such as the Mach-Zehnder interferometer.

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