On-Wafer Characterization of Thermomechanical Properties of Isotropic Thin Films Deposited on Anisotropic Substrates

Published 2008 View Full Article

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Title
On-Wafer Characterization of Thermomechanical Properties of Isotropic Thin Films Deposited on Anisotropic Substrates
Authors
Keywords
-
Journal
JAPANESE JOURNAL OF APPLIED PHYSICS
Volume 47, Issue 7, Pages 5623-5629
Publisher
Japan Society of Applied Physics
Online
2008-07-18
DOI
10.1143/jjap.47.5623

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