4.7 Article

Electroless Pd membrane deposition on alumina modified porous Hastelloy substrate with EDTA-free bath

Journal

INTERNATIONAL JOURNAL OF HYDROGEN ENERGY
Volume 35, Issue 6, Pages 2328-2335

Publisher

PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.ijhydene.2010.01.054

Keywords

Pd; Membrane; Hydrogen; Electroless plating; Porous substrate

Funding

  1. Korean Government [KRF-2008-357-D00054]
  2. National Research Foundation of Korea [2008-357-D00054] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)

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This study demonstrates palladium membranes can be electrolessly plated on aluminum oxide-modified porous Hastelloy with hydrazine using an EDTA-free bath. The plating bath temperature affected the membrane surface morphology, with the palladium grain size increasing with increasing temperature. A 7.5 mu m thick membrane plating was obtained at room temperature. Helium leak testing confirmed that the membrane was free of defects. Hydrogen permeation test showed that the membrane had a hydrogen permeation flux of 3.3 x 10(-1) mol m(-2) s(-1) at a temperature of 823 K and at a pressure difference of 100 kPa. There was no measurable interdiffusion between the membrane film and the porous Hastalloy substrate at 823 K. This room temperature membrane plating method provides several advantages such as very high selectivity, stability, favorable energy efficiency and simplicity. (C) 2010 Professor T. Nejat Veziroglu. Published by Elsevier Ltd. All rights reserved.

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