Band alignment at interfaces of few-monolayer MoS2 with SiO2 and HfO2

Published 2015 View Full Article

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Title
Band alignment at interfaces of few-monolayer MoS2 with SiO2 and HfO2
Authors
Keywords
Interface barrier, Internal photoemission, Electron affinity, Band offset
Journal
MICROELECTRONIC ENGINEERING
Volume 147, Issue -, Pages 294-297
Publisher
Elsevier BV
Online
2015-05-03
DOI
10.1016/j.mee.2015.04.106

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