Ruthenium and ruthenium dioxide thin films deposited by atomic layer deposition using a novel zero-valent metalorganic precursor, (ethylbenzene)(1,3-butadiene)Ru(0), and molecular oxygen

Published 2015 View Full Article

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Title
Ruthenium and ruthenium dioxide thin films deposited by atomic layer deposition using a novel zero-valent metalorganic precursor, (ethylbenzene)(1,3-butadiene)Ru(0), and molecular oxygen
Authors
Keywords
Atomic layer deposition, Ruthenium, Ruthenium oxide, Zero-valent metal-organic precursor, Nucleation
Journal
MICROELECTRONIC ENGINEERING
Volume 137, Issue -, Pages 16-22
Publisher
Elsevier BV
Online
2015-02-20
DOI
10.1016/j.mee.2015.02.026

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