Reactive ion beam etching of fused silica using vertical lamellar patterns of PS-b-PMMA diblock copolymer masks

Published 2015 View Full Article

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Title
Reactive ion beam etching of fused silica using vertical lamellar patterns of PS-b-PMMA diblock copolymer masks
Authors
Keywords
Pattern transfer, Nanometer size, Diblock copolymer, Reactive ion beam etching, Silicon dioxide, Self-assembly
Journal
MICROELECTRONIC ENGINEERING
Volume 141, Issue -, Pages 289-293
Publisher
Elsevier BV
Online
2015-04-26
DOI
10.1016/j.mee.2015.04.032

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